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Stanford Nanofabrication Facility
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Carbon based materials
Chemical Formula:
Various C-based
"Non-standard" Carbon based materials need PROM approval for use.
Equipment Tabs
Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si
Si3N4
SiGe
SiO
2
SiON
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Flexible
SNF Cleanroom Paul G Allen L107
C
Si3N4
SiC
SiO
2
Various C-based