The "All" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "All" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Exposure Wavelength | Resist | Developer | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|
|
SVG Develop Track 2 svgdev2 |
"All" | 25 4 inch wafers | ||||||||
|
SVG Resist Coat Track 1 svgcoat |
"All" | 25 4 inch wafers | ||||||||
|
SVG Resist Coat Track 2 svgcoat2 |
"All" | 25 4 inch wafers | ||||||||
|
Ultraviolet Photoresist Cure uvcure |
"All" | 254 nm | ||||||||
|
Woollam woollam |
"All" | 1 | ||||||||
|
Xactix Xenon Difluoride Etcher xactix |
"All" | 1 |