Dry etching refers to the processes that use energetic gaseous species produced by a plasma to remove material. In order to modulate and control the etching conditions and characteristics, different types of plasma sources are utilized in the dry etching process and the equipment are categorized accordingly.
If you would like to learn about different types of dry etchers and how to chose your etcher, please visit the online dry etching course.
If you would like to see a summary of etchers for a specific material (i.e. SiO2 or poly silicon) please visit the materials page.