Chemical Formula:
80% He/ 20%O2
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Lam Research TCP 9400 Poly Etcher lampoly |
SNF Paul G Allen L107 Cleanroom |
No equipment matches all of the filter criteria you have set above.