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Silane

Chemical Formula:

SiH₄

Gases Equipment Tabs

Etch Equipment Table

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Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aixtron MOCVD - III-N system aix-ccs	Clean (MOCVD)	SNF MOCVD Paul G Allen 213XA	0.00 - 5.00 μm	AlGaN AlN GaN III-N materials InAlN InGaAlN InGaN InN
Aixtron MOCVD - III-V system aix200	Flexible	SNF MOCVD Paul G Allen 213XA	0.00 - 5.00 μm	AlAs AlGaAs GaAs GaP GaPN III-V materials InAs InGaAs InGaAsN
AMAT Centurion Epitaxial System epi2	Clean	SNF Cleanroom Paul G Allen L107	50.00 Å - 3.00 μm	Ge Si SiGe
PlasmaTherm Versaline HDP CVD System hdpcvd	All	SNF Cleanroom Paul G Allen L107	500.00 Å - 4.00 μm	Si Si3N4 SiC SiO₂ SiON
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly	Flexible	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	Ge Si Si SiGe
Tystar Bank 1 Tube 4 LTO B1T4 Flexible LTO	Flexible	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	SiO₂
Tystar Bank 2 Tube 8 LTO B2T8 Clean LTO	Clean	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	SiO₂
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly	Clean	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	Si Si