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Chlorine
Chemical Formula:
Cl
2
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
Lam Research TCP 9400 Poly Etcher
lampoly
Clean
Semiclean
SNF Paul G Allen L107 Cleanroom
Si
Ge
SiGe
80% He/ 20%O
2
C
2
F
6
CF
4
Cl
2
HBr
He
N
2
O
2
Oxford III-V etcher
Ox-35
Flexible
SNF Paul G Allen L107 Cleanroom
GaAs
AlGaN
AlInP
GaN
InGaP
InSb
Ar
BCl
3
CH
4
Cl
2
H
2
HBr
N
2
O
2
SF
6
Oxford Plasma Pro ICP-RIE
Ox-gen
Clean
SNF Paul G Allen L107 Cleanroom
BCl
3
CF
4
Cl
2
O
2
SF
6
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
Flexible
SNF Paul G Allen L107 Cleanroom
Metals or metal compounds with volatile byproducts
Al
GaN
Ar
BCl
3
CF
4
CH
4
Cl
2
N
2
O
2
SF
6
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
