This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
LixAlyOz ALD 09/03/2015 (all day) Request to make Lithium-Aluminum-Oxide in Savannah. Savannah ALD (savannah),
Woollam (woollam)
Request approved. Savannah chamber will need to be sent for cleaning after processing.
ITO Sputtering Target in Metallica 09/02/2015 (all day) Request to use ITO sputtering target in Metallica. Request approved. Recipes with O2 will require coordination of equipment modification with staff.
Exnodes PROM 08/31/2015 (all day) Request to use cleanroom space to conduct demo of users' equipment. Request approved. Minimum 3 hours staff time will be charged.
Ferritin from Equine Spleen 08/17/2015 (all day) Request to use Ferritin in SNF as a catalyst for CNT growth. First Nano carbon nanotube CVD furnace (cvd-nanotube) Request approved. Wet processing before CNT furnace to be performed in nSiL lab outside of SNF.
HgCdTe/HgTe/HgCdTe quantum wells on GaAs substrate 08/17/2015 (all day) Request to do low temp Al2O3 deposition on new materials in Savannah. Pieces will be on carrier wafers. Savannah ALD (savannah) Request approved. Chamber to be coated with 200 cycles of Al2O3 at 200C after deposition.
Post wafer dicing pieces in lampoly 08/13/2015 (all day) Request to take pieces post wafer dicing (gold) into lampoly (clean). Lam Research TCP 9400 Poly Etcher (lampoly) Request approved only when resist is present during dicing to prevent massive amounts of particles.
HSQ bonding in evbond 08/13/2015 (all day) Bonding procedure developed with SNF staff to use HSQ in evbond. SVG Resist Coat Track 1 (svgcoat),
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)
Request approved.
Request to use CT-3000 Color Resist 08/06/2015 (all day) Request to bring new color resist into SNF. Request approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information
Backside Removal of SOI-on-LiNbO3 in PT-DSE 07/28/2015 (all day) Process developed to remove backside silicon on PT-DSE. Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE) Form submitted for archival purposes.
Request to deposit 75nm of Al2O3 on Savannah 07/23/2015 (all day) Request to exceed 50nm limit for deposition on Savannah. Savannah ALD (savannah) Requestor decided more cost effective process was to send out for deposition at LGA films.

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