This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Use of low-outgassing silicone glue in metal evaporation system | 07/20/2015 (all day) | Request to use Master Bond MS921-LO to make shadow masks for intlvac-evap. | Intlvac Evaporator (Intlvac_evap) | Request approved. |
| Use of CO on Fiji2 | 07/14/2015 (all day) | Request to use CO gas bottle on Fiji2 for nucleation studies. | Fiji 2 ALD (fiji2) | Request approved. |
| Request to use SR-5030L Color Photo Resist | 07/09/2015 (all day) | Request to bring new color resist into SNF. | Request approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information | |
| Request to enter material required for spin coating PVDF films in SNF. | 07/03/2015 (all day) | Request to bring new materials into the SNF in order to spin coat PVDF films. | Headway Manual Resist Spinner (headway2) | Request approved. |
| MasterBond UV15LV | 06/23/2015 (all day) | Request to use MasterBond UV15LV in Laurell in wafer saw room. | Request approved. | |
| Hot wet etch for SiC | 06/20/2015 (all day) | Request to use hot HF:HNO3 solution to etch silicon carbide. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request rejected due to safety concerns. |
| Request to use Langatate material in the SNF | 06/19/2015 (all day) | Request to bring in new material (Langatate) and develop HSQ bonding procedure. | Headway Manual Resist Spinner (headway2) | Request approved. |
| ALD on thermally reduced graphene oxide in Fiji2 | 06/09/2015 (all day) | Request to bring graphene oxide on diamond wafers into SNF for processing on Fiji2. |
Fiji 2 ALD (fiji2), PlasmaTherm Shuttlelock PECVD System (ccp-dep) |
Request approved. |
| Request to spin Teflon on Headway | 06/09/2015 (all day) | Request to spin Teflon on Headway. | Headway Manual Resist Spinner (headway2) | Request approved. |
| Nafion dispersion D1021 in SNF | 06/09/2015 (all day) | Request to bring Nafion D1021 into SNF to coat in Metallica and etch in Drytek2. Nafion to be dipsersed outside of SNF. |
SVG Resist Coat Track 1 (svgcoat), Karl Suss MA-6 Contact Aligner (karlsuss) |
Request approved. Requestors will work with Usha to develop etch recipe. |