PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
---|---|---|---|---|
Modified Process on STS | 09/23/2015 | Use STS to generate Ni catalyst balls from thin film. | Request approved. No equipment modifications will be allowed. | |
FFEM LCD Resist and Developer for Lithography | 09/23/2015 | Use of SK6000 resist and CD-2060 developer and storage of chemicals for 2 weeks. | Headway Manual Resist Spinner (headway2) | Request approved. |
Microchem PRL for Lithography | 09/23/2015 | Use of Microchem PRL and storage of chemical for 2 weeks. |
Headway Manual Resist Spinner (headway2), Karl Suss MA-6 Contact Aligner (karlsuss), Oven (White) (white-oven) |
Request approved. |
Toray Light Shielding Material for Lithography | 09/23/2015 | Use of TABK-5000 and storage of chemical for 2 weeks. |
Headway Manual Resist Spinner (headway2), Karl Suss MA-6 Contact Aligner (karlsuss), Oven (White) (white-oven) |
Request approved. |
Use of SB-5000L | 09/14/2015 | Request to use SB-5000L Color Resist in SNF. | Request approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information | |
CMP of PbS | 09/14/2015 | Request to use CMP to polish PbS film. | CMP GnP POLI-400L (cmp) | Request approved. |
LixAlyOz ALD | 09/03/2015 | Request to make Lithium-Aluminum-Oxide in Savannah. |
Savannah ALD (savannah), Woollam (woollam) |
Request approved. Savannah chamber will need to be sent for cleaning after processing. |
ITO Sputtering Target in Metallica | 09/02/2015 | Request to use ITO sputtering target in Metallica. | Request approved. Recipes with O2 will require coordination of equipment modification with staff. | |
Exnodes PROM | 08/31/2015 | Request to use cleanroom space to conduct demo of users' equipment. | Request approved. Minimum 3 hours staff time will be charged. | |
Ferritin from Equine Spleen | 08/17/2015 | Request to use Ferritin in SNF as a catalyst for CNT growth. | First Nano carbon nanotube CVD furnace (cvd-nanotube) | Request approved. Wet processing before CNT furnace to be performed in nSiL lab outside of SNF. |