This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Annealing of 1 cm2 GaAs Chip at 450 C in RTA | 03/10/2017 (all day) | Procedure to anneal As containing chips at high temperatures while minimizing safety risk for inhaling As. | RTA AllWin 610 (aw610_l) | Request approved. |
| Wet Etch Process using Nitric Acid and H2O2 | 03/10/2017 (all day) | Use existing chemicals for Nitric and H2O2 at SNF for non standard process. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |
| Ti3Se resist and AZ400K developer for selective HF etch | 02/09/2017 (all day) | Request to bring new chemicals in for lithography. | Headway Manual Resist Spinner (headway2) | Request approved. |
| New Chemicals for Lithography | 01/26/2017 (all day) | New chemicals proposed, run sheet and preliminary results documented. | Request approved. Please see process staff for details. | |
| BaFe2As2 in Finetech bonder and s-neox | 01/24/2017 (all day) | Request to use BaFe2As2 in Finetech bonder and s-neox. | Request approved. Snorkel required during bonder use. | |
| Classifying Fiji1 as a clean tool | 12/14/2016 (all day) | Procedure proposed to allow Fiji1 to be used as a clean tool. Data collection required. Collected data showed this procedure is not sufficient to remove contamination risk to epi. | AMAT Centurion Epitaxial System (epi2) | Data collection approved. Results demonstrated that procedure is not sufficient to remove contamination risk. |
| QB50 CubeSat servicing | 12/05/2016 (all day) | Allow debugging of cubesat in cleanroom using N2 guns. | Approved. | |
| Request for GaSb target in Lesker sputter | 11/02/2016 (all day) | Request for GaSb target in Lesker sputter. | Lesker Sputter (lesker-sputter) | Approved. Coordination with equipment staff required to ensure safety precautions are taken. |
| ALD of Lithium containing thin films | 10/31/2016 (all day) | Change Fiji3 contamination categories to allow processing of Lithium-containing thin films. | Fiji 3 ALD (fiji3) | Approved. VPD-ICPMS data analysis demonstrated some remaining Li contamination risk to future Fiji3 users. Lab community notified. |
| Microchem LOR5A Liftoff Resist | 10/31/2016 (all day) | Use of Microchem LOR5A Liftoff Resist in SNF. | Headway Manual Resist Spinner (headway2) | Approved. |