ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch | 03/14/2016 | Request to create Si smoothing process in CNT furnace (similar to Epi process but in contamintated category furnace). | First Nano carbon nanotube CVD furnace (cvd-nanotube) | Approved. |
| XeF2 etching of Si pillars implanted in retina fixed in resin | 03/14/2016 | Request to use XeF2 etcher to etch rat retina embedded with Si. |
Xactix Xenon Difluoride Etcher (xactix), Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE) |
Approved. |
| Spin coat polyimide in Fiji2 | 02/02/2016 | Request to allow spin coated PI in Fiji2. | Fiji 2 ALD (fiji2) | Approved. |
| Request to use SG-5001L Color Resist | 01/19/2016 | Request to use SG-5001L Color Resist in SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details. | |
| Request to allow using attachments on Woollam ellipsometer that enable characterization of liquid samples | 01/19/2016 | Request to create liquid sample attachments for Woollam. | Woollam (woollam) | Approved. |
| VO2 CNT device process flow | 11/20/2015 | Process flow to introduce VO2 CNT devices in SNF. | Request approved. | |
| New SrO ALD precursor | 11/19/2015 | Request to use new experimental BASF SrO ALD precursor in Fiji2. |
Fiji 2 ALD (fiji2), Woollam (woollam) |
Request approved. |
| Use of Toray DL1000C | 11/16/2015 | Request to use DL-1000C color resist in SNF. | Request approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information | |
| Use of unopened old wafers (circa 2009) | 11/11/2015 | Request to use old 1K ox wafers in gold contaminated toolset. | Request approved. | |
| Etching of contaminated wafer pieces in Lampoly | 09/30/2015 | Request to use Lampoly to etch straight profiles into contaminated wafer pieces. |
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE), Lam Research TCP 9400 Poly Etcher (lampoly) |
Request approved with ICPMS contamination collection. |
