This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| ITO Etching in Ox35 | 04/08/2016 (all day) | Request to change contamination level and use Ox35 for ITO etching. | Oxford III-V etcher (Ox-35) | Approved with ongoing data collection. |
| ALD Deposition on Carbon Felts | 04/01/2016 (all day) | Request to use Fiji2 for Carbon Felt substrate. | Fiji 2 ALD (fiji2) | Approved. |
| Bringing Transene TE-100 into SNF | 03/29/2016 (all day) | Request to bring new chemical into SNF for ITO etch. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Approved. Waste must be collected and tagged for disposal. |
| Request to use Zeocoat ES2110-10 | 03/21/2016 (all day) | Request to use Zeocoat ES2110-10 in SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details. | |
| H2 Anneal in CVD Nano Tube Tool of Silicon for Smoothing Sidewall Scallops Formed During Bosch Process Deep Silicon Etch | 03/14/2016 (all day) | Request to create Si smoothing process in CNT furnace (similar to Epi process but in contamintated category furnace). | First Nano carbon nanotube CVD furnace (cvd-nanotube) | Approved. |
| XeF2 etching of Si pillars implanted in retina fixed in resin | 03/14/2016 (all day) | Request to use XeF2 etcher to etch rat retina embedded with Si. |
Xactix Xenon Difluoride Etcher (xactix), Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE) |
Approved. |
| Spin coat polyimide in Fiji2 | 02/02/2016 (all day) | Request to allow spin coated PI in Fiji2. | Fiji 2 ALD (fiji2) | Approved. |
| Request to use SG-5001L Color Resist | 01/19/2016 (all day) | Request to use SG-5001L Color Resist in SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details. | |
| Request to allow using attachments on Woollam ellipsometer that enable characterization of liquid samples | 01/19/2016 (all day) | Request to create liquid sample attachments for Woollam. | Woollam (woollam) | Approved. |
| VO2 CNT device process flow | 11/20/2015 (all day) | Process flow to introduce VO2 CNT devices in SNF. | Request approved. |