This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Request to use Zeocoat CP1010-14 | 06/13/2017 (all day) | Proposed process for use of Zeocoat CP1010-14. | Request approved. Please see process staff for details. | |
| Strontium Aluminate Use | 06/13/2017 (all day) | Proposed process for use of strontium aluminate. | Request approved. Please see process staff for details. | |
| Hydrogen Anneal of Si Wafer after PT-DSE | 05/24/2017 (all day) | Request to hydrogen anneal contaminated wafers in epi furnace. | AMAT Centurion Epitaxial System (epi2) | Request approved to try H2 anneal in graphene furnace. Data collection showed graphene furnace is not viable option. |
| Request to use Lampoly to etch Si deposited on ALD oxide/metal | 05/23/2017 (all day) | Etch non-standard semiclean films in clean Lampoly etcher. | Lam Research TCP 9400 Poly Etcher (lampoly) | Request approved. |
| Ta3N5 ALD in Fiji3 | 05/20/2017 (all day) | Request for non-standard processing in Fiji3. Request approved. | Fiji 3 ALD (fiji3) | Request approved. Chamber isolation with HfO2 required after processing. |
| Electrical Test Equipment for in-cleanroom capacitance test | 05/19/2017 (all day) | Electrical Test Equipment for in-cleanroom capacitance test. Location reviewed with staff. | Request approved. | |
| Thick low-temp ALD Al2O3 for Insulating Spacers | 05/17/2017 (all day) | Request for long ALD run outside of standard operating procedure. | Savannah ALD (savannah) | Request approved. |
| Ammonium Sulfide (NH4)2S, 20% Aqueous solution | 04/21/2017 (all day) | Request and procedure to use (NH4)S into SNF | PlasmaTherm Shuttlelock PECVD System (ccp-dep) | Request approved. |
| Etch of wafer pieces cut by DISCO Wafersaw in Lampoly | 04/13/2017 (all day) | Procedure to go from wafer saw to clean Lampoly etcher. | Lam Research TCP 9400 Poly Etcher (lampoly) | Request approved. |
| Deposit LPCVD nitride on 10 nm ALD Al2O3 | 03/21/2017 (all day) | Procedure to go from Fiji1 (semiclean) to LPCVD furnace (clean). | Fiji 1 ALD (fiji1) | Request approved. |