ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Ta3N5 ALD in Fiji3 | 05/20/2017 | Request for non-standard processing in Fiji3. Request approved. | Fiji 3 ALD (fiji3) | Request approved. Chamber isolation with HfO2 required after processing. |
| Electrical Test Equipment for in-cleanroom capacitance test | 05/19/2017 | Electrical Test Equipment for in-cleanroom capacitance test. Location reviewed with staff. | Request approved. | |
| Thick low-temp ALD Al2O3 for Insulating Spacers | 05/17/2017 | Request for long ALD run outside of standard operating procedure. | Savannah ALD (savannah) | Request approved. |
| Ammonium Sulfide (NH4)2S, 20% Aqueous solution | 04/21/2017 | Request and procedure to use (NH4)S into SNF | PlasmaTherm Shuttlelock PECVD System (ccp-dep) | Request approved. |
| Etch of wafer pieces cut by DISCO Wafersaw in Lampoly | 04/13/2017 | Procedure to go from wafer saw to clean Lampoly etcher. | Lam Research TCP 9400 Poly Etcher (lampoly) | Request approved. |
| Deposit LPCVD nitride on 10 nm ALD Al2O3 | 03/21/2017 | Procedure to go from Fiji1 (semiclean) to LPCVD furnace (clean). | Fiji 1 ALD (fiji1) | Request approved. |
| Annealing of 1 cm2 GaAs Chip at 450 C in RTA | 03/10/2017 | Procedure to anneal As containing chips at high temperatures while minimizing safety risk for inhaling As. | RTA AllWin 610 (aw610_l) | Request approved. |
| Wet Etch Process using Nitric Acid and H2O2 | 03/10/2017 | Use existing chemicals for Nitric and H2O2 at SNF for non standard process. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |
| Ti3Se resist and AZ400K developer for selective HF etch | 02/09/2017 | Request to bring new chemicals in for lithography. | Headway Manual Resist Spinner (headway2) | Request approved. |
| New Chemicals for Lithography | 01/26/2017 | New chemicals proposed, run sheet and preliminary results documented. | Request approved. Please see process staff for details. |
