This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Processing of wafers with embedded Tungsten alignment marks in the clean equipment group | 06/19/2018 (all day) | Using clean etchers to process wafers with non-clean materials. | Lam Research TCP 9400 Poly Etcher (lampoly) | Request approved. Data appended. |
| Water 18O for use in Savannah ALD | 05/31/2018 (all day) | Add 18O water to Savannah for ALD | Savannah ALD (savannah) | Request approved. |
| Creative Materials conductive inks: EXP 2649-76, 125-19FS, 118-41 | 05/29/2018 (all day) | Request to use commercial conductive inks on Voltera | Voltera (voltera) | Request approved pending SOP submission. |
| CO in Fiji2 Revival | 05/29/2018 (all day) | Use of CO in Fiji2 and special processing requirements documentation. Revival of previous request that was successful. | Fiji 2 ALD (fiji2) | Request approved. |
| Request for Acetic Acid | 04/26/2018 (all day) | Request to use acetic acid in SNF | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |
| InOx Thin Film Development on Savannah ALD system | 04/25/2018 (all day) | Develop InOx recipe on Savannah (had previously only been on Fiji2) |
Savannah ALD (savannah), Woollam (woollam) |
Request approved. |
| Thick ALD processing | 04/19/2018 (all day) | Deposition of films thicker than the 50nm limit | Request approved. Please see process staff for details. | |
| Continued processing of UV Laser ablated silicon wafers | 04/12/2018 (all day) | SNF processing of wafers that have been UV Ablated in another location | Request approved. | |
| InAs Heterostructure in Savannah | 03/26/2018 (all day) | Calculations performed to demonstrate no risk of As exposure in un-loadlocked Savannah system. | Savannah ALD (savannah) | Request approved. |
| Direct laser writing of a negative photoresist (mr-DWL 100) | 03/22/2018 (all day) | Approval to use negative resist with standard substrates on Heidelberg. |
Heidelberg MLA 150 (heidelberg), Headway 3 Manual Resist Spinner (headway3) |
Request approved. |