PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
---|---|---|---|---|
Request for Acetic Acid | 04/26/2018 | Request to use acetic acid in SNF | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |
InOx Thin Film Development on Savannah ALD system | 04/25/2018 | Develop InOx recipe on Savannah (had previously only been on Fiji2) |
Savannah ALD (savannah), Woollam (woollam) |
Request approved. |
Thick ALD processing | 04/19/2018 | Deposition of films thicker than the 50nm limit | Request approved. Please see process staff for details. | |
Continued processing of UV Laser ablated silicon wafers | 04/12/2018 | SNF processing of wafers that have been UV Ablated in another location | Request approved. | |
InAs Heterostructure in Savannah | 03/26/2018 | Calculations performed to demonstrate no risk of As exposure in un-loadlocked Savannah system. | Savannah ALD (savannah) | Request approved. |
Direct laser writing of a negative photoresist (mr-DWL 100) | 03/22/2018 | Approval to use negative resist with standard substrates on Heidelberg. |
Heidelberg MLA 150 (heidelberg), Headway 3 Manual Resist Spinner (headway3) |
Request approved. |
mr-DWL use and non-standard substrates for Heidelberg | 03/13/2018 | Use of mr-DWL with non-standard substrates for Heidelberg. | Request approved. Please see process staff for details. | |
Spin-coat Linear poly(phthalaldehydes) (PPAs) diluted in Anisole | 03/09/2018 | Use of PPA in the labs. | Request approved. Please see process staff for details. | |
Proposal to use commercial Inkjet Inks in Dimatix | 02/09/2018 | Use of a variety of Metalon and and Methode Electronics Inkjet inks in Dimatix. | Request rejected due to safety concerns. | |
Nickel and Copper Etchants, Al2O3 etchant and Fe2O3 etchant | 02/05/2018 | Proposal to bring in Transene chemistries for etching in the SNF. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |