ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Potassium Dichromate 0.15M solution for defect etching | 02/25/2019 | Request to make chemical mixture using powder in Room 155, then bring solution into cleanroom for etching at wbflexcorr. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Approved. |
| Zr ICP Standard use in SNF | 02/21/2019 | Bring in small vial of Zr ICP standard for use in SNF. | Request approved. Please see process staff for details. | |
| Wafer scribe and etch procedure to go into clean etch tools | 02/19/2019 | Introduce jig and create process flow to dice a wafer into pieces and be allowed into clean etch tools without addtional cleans. | Epilog Fusion M2 Laser Cutter (lasercutter) | Approved. |
| Developing Backside Alignment with chips on Heidelberg | 02/14/2019 | Introduce jig for creating backside alignment procedure for Heidelberg. | Heidelberg MLA 150 (heidelberg) | Approved. |
| U2OS cells on nanostructure for Critical Point Drier | 02/06/2019 | Request to use BSL1 cells in Critical Point Drier | Critical Point Dryer Tousimis Automegasamdri-915B (cpd) | Approved. |
| Etching of wafers in lampoly with LiNb coated by resist | 01/22/2019 | Request to modify previously approved process for etching of wafers containing LiNb, but not etching LiNb on lampoly | Lam Research TCP 9400 Poly Etcher (lampoly) | Approved. |
| Use of Aquadag-E in Micromist Coater | 01/18/2019 | Introduce new material for use in Micromist Coater. | Request Approved. | |
| Use of DA-1000 in SNF | 01/10/2019 | Request to introduce new resist, DA-1000 to SNF | Request approved. Please see process staff for details. | |
| Coating process for nanotube ink | 01/10/2019 | Defining tools and process conditions to coat nanotube ink on silicon wafers. | Request approved. Please see process staff for details. | |
| Cleaning Sapphire Wafer in wbclean 1 and 2 | 12/13/2018 | Request to put non-traditional material, new sapphire wafers in wbclean 1 and 2. |
Wet Bench Clean 1 (wbclean-1), Wet Bench Clean 2 (wbclean-2) |
Request approved. |
