Use of Chlorosilane in Mavericks |
08/15/2018 |
Use of Chlorosilane for PDMS functionalization in Room 155. |
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Request approved. |
Ultrasol 3EX Slurry |
08/13/2018 |
Use of Ultrasol 3EX Slurry in the CMP. |
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Request approved. Please see process staff for details. |
Use of ATX2020SPe as spin on dielectric |
07/28/2018 |
Use of ATX2020SPe as spin on dielectric in multiple SNF tools |
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Request approved. Please see process staff for details. |
3M Novec 73DE for Epoxy Bonding |
07/10/2018 |
Use of 3M Novec 73DE as a substitute for TCE for cleaning. |
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Request approved. Please see process staff for details. |
Shinetsu SINR-DF3570 dry film negative photoresist |
06/25/2018 |
Use of Shinetsu dry film photoresist is approved for use with new incoming laminator that will reside in Stinson. |
|
Request approved. Please see process staff for details. |
Use of HFE7100 in Stinson |
06/25/2018 |
Use of fluorinated chemistry for low surface tension rinse step to reduce damage to Nanscribe printed devices. |
Nanoscribe Photonics GT (nanoscribe) |
Request approved. Separated waste collection required. |
Processing of wafers with embedded Tungsten alignment marks in the clean equipment group |
06/19/2018 |
Using clean etchers to process wafers with non-clean materials. |
Lam Research TCP 9400 Poly Etcher (lampoly) |
Request approved. Data appended. |
Water 18O for use in Savannah ALD |
05/31/2018 |
Add 18O water to Savannah for ALD |
Savannah ALD (savannah) |
Request approved. |
CO in Fiji2 Revival |
05/29/2018 |
Use of CO in Fiji2 and special processing requirements documentation. Revival of previous request that was successful. |
Fiji 2 ALD (fiji2) |
Request approved. |
Creative Materials conductive inks: EXP 2649-76, 125-19FS, 118-41 |
05/29/2018 |
Request to use commercial conductive inks on Voltera |
Voltera (voltera) |
Request approved pending SOP submission. |