This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| ALD of WO3 in Fiji3 | 09/11/2018 (all day) | Proposal to allow WO3, which is a non-standard film on Fiji3 to take advantage of the boost capability. | Fiji 3 ALD (fiji3) | Request approved with ICPMS contamination collection. Data review is appended. |
| Process for using the AJA Evaporator in a Semiclean Fashion | 08/20/2018 (all day) | Procedure documentation of use of the flexible AJA cleanliness category in a semiclean manner. |
AJA Evaporator (aja-evap), Lam Research TCP 9400 Poly Etcher (lampoly) |
Request approved. |
| Lampoly HBr/Cl2/O2 etching of silicon oxide on lithium niobate | 08/18/2018 (all day) | Request to introduce LiN into a clean category etcher. |
PlasmaTherm Shuttlelock PECVD System (ccp-dep), Lam Research TCP 9400 Poly Etcher (lampoly) |
Request approved. VPD Analysis complete. |
| Use of Chlorosilane in Mavericks | 08/15/2018 (all day) | Use of Chlorosilane for PDMS functionalization in Room 155. | Request approved. | |
| Use of NH4Cl in SNF | 08/15/2018 (all day) | Use of 5% Ammonium Chloride mixture in wbflexcorr. | Request approved. Please see process staff for details. | |
| Ultrasol 3EX Slurry | 08/13/2018 (all day) | Use of Ultrasol 3EX Slurry in the CMP. | Request approved. Please see process staff for details. | |
| Use of ATX2020SPe as spin on dielectric | 07/28/2018 (all day) | Use of ATX2020SPe as spin on dielectric in multiple SNF tools | Request approved. Please see process staff for details. | |
| 3M Novec 73DE for Epoxy Bonding | 07/10/2018 (all day) | Use of 3M Novec 73DE as a substitute for TCE for cleaning. | Request approved. Please see process staff for details. | |
| Shinetsu SINR-DF3570 dry film negative photoresist | 06/25/2018 (all day) | Use of Shinetsu dry film photoresist is approved for use with new incoming laminator that will reside in Stinson. | Request approved. Please see process staff for details. | |
| Use of HFE7100 in Stinson | 06/25/2018 (all day) | Use of fluorinated chemistry for low surface tension rinse step to reduce damage to Nanscribe printed devices. | Nanoscribe Photonics GT (nanoscribe) | Request approved. Separated waste collection required. |