This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
mr-DWL use and non-standard substrates for Heidelberg 03/13/2018 (all day) Use of mr-DWL with non-standard substrates for Heidelberg. Request approved. Please see process staff for details.
Spin-coat Linear poly(phthalaldehydes) (PPAs) diluted in Anisole 03/09/2018 (all day) Use of PPA in the labs. Request approved. Please see process staff for details.
Proposal to use commercial Inkjet Inks in Dimatix 02/09/2018 (all day) Use of a variety of Metalon and and Methode Electronics Inkjet inks in Dimatix. Request rejected due to safety concerns.
Nickel and Copper Etchants, Al2O3 etchant and Fe2O3 etchant 02/05/2018 (all day) Proposal to bring in Transene chemistries for etching in the SNF. Wet Bench Flexcorr 1 (wbflexcorr-1) Request approved.
Deposition of thermal Nitride in ThermcoNitride1 on pieces of Diamond, Silicon Carbide 01/30/2018 (all day) Use of ThermcoNitride for non-standard substrates. Request approved.
Hydrogel-based capacitive pH sensors 01/18/2018 (all day) Proposed protocol and chemical usage to create hydrogel capacitors in SNF. Headway Manual Resist Spinner (headway2),
Karl Suss MA-6 Contact Aligner (karlsuss)
Request approved.
ZnO recipe modifications for Savannah 01/16/2018 (all day) Recipe modifications proposed for Savannah run. Request approved. Please see process staff for details.
Spinning and Etching CYTOP 01/11/2018 (all day) Spinning and etching of CYTOP in SNF. Request approved. Please see process staff for details.
Chemicals for use with the Micromist Coater 12/05/2017 (all day) Request to use Creative Chemicals 122-06 and B119-44 in Micromist. Request approved.
KMPR 1000 12/04/2017 (all day) Request to use KMPR 1000 in Headway. Headway Manual Resist Spinner (headway2) Request approved.

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