This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Use of Aquadag-E in Micromist Coater | 01/18/2019 (all day) | Introduce new material for use in Micromist Coater. | Request Approved. | |
| Coating process for nanotube ink | 01/10/2019 (all day) | Defining tools and process conditions to coat nanotube ink on silicon wafers. | Request approved. Please see process staff for details. | |
| Use of DA-1000 in SNF | 01/10/2019 (all day) | Request to introduce new resist, DA-1000 to SNF | Request approved. Please see process staff for details. | |
| Cleaning Sapphire Wafer in wbclean 1 and 2 | 12/13/2018 (all day) | Request to put non-traditional material, new sapphire wafers in wbclean 1 and 2. |
Wet Bench Clean 1 (wbclean-1), Wet Bench Clean 2 (wbclean-2) |
Request approved. |
| Use of Liquid Crystalline Photoresist in Nanoscribe | 12/05/2018 (all day) | Request for new photoresist to be used in Nanoscribe. |
Woollam (woollam), Nanoscribe Photonics GT (nanoscribe) |
Request approved. |
| Use of MDCK cells in CPD | 11/29/2018 (all day) | Request to bring in biosafety level 1 cells into SNF to use in the Critical Point Dryer. | Critical Point Dryer Tousimis Automegasamdri-936 (cpd) | Request approved. |
| Low Temp SiGe depositon on PI in Thermcopoly2 | 11/13/2018 (all day) | Request to put Polyimide in Thermcopoly2. | Request approved. Please see process staff for details. | |
| DC-136 Use in Micromist Coater | 11/13/2018 (all day) | Request to bring in new polymer chemistry for use with micromist. | Request approved. Please see process staff for details. | |
| ZnO film development on MVD | 11/06/2018 (all day) | Request to use MVD and ozone capability to develop ZnO recipe. | Request approved. Please see process staff for details. | |
| Aqueous Carbon Black Ink for Dimatix | 11/05/2018 (all day) | Request to use JR-700HV Resistive Ink in Dimatix printer | Request approved. Please see process staff for details. |