This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
Poly(pentafluorostyrene) spin coating in SNF 06/06/2019 (all day) Bring in new chemistry to use with SNF spin coating. Headway Manual Resist Spinner (headway2),
Profilometer Alphastep 500 (alphastep)
Approved.
Poly(4-tert-butylstyrene) spin coating in SNF 06/06/2019 (all day) Bring in new chemistry to use with SNF spin coating. Headway Manual Resist Spinner (headway2),
Profilometer Alphastep 500 (alphastep)
Approved.
Poly(4-chlorostyrene) spin coating in SNF 06/06/2019 (all day) Bring in new chemistry to use with SNF spin coating. Headway Manual Resist Spinner (headway2),
Profilometer Alphastep 500 (alphastep)
Approved.
Poly(4-hydroxystyrene) spin coating in SNF 06/06/2019 (all day) Bring in new chemistry to use with SNF spin coating. Headway Manual Resist Spinner (headway2),
Profilometer Alphastep 500 (alphastep)
Approved
Use of LOL1000 in SNF 05/30/2019 (all day) Bring new lift off resist into SNF. Request approved. Please see process staff for details.
Request to use negative photoresist photoresist ‘NR9-3000PY’ in SNF 05/30/2019 (all day) Bring new negative photoresist into SNF. Headway Manual Resist Spinner (headway2),
Karl Suss MA-6 Contact Aligner (karlsuss),
Wet Bench Miscellaneous (wbmiscres)
Approved.
Use of EKC 640 in SNF 05/22/2019 (all day) Request to try new chemistry in SNF tools. Request approved. Please see process staff for details.
Aqua Regia etch of Pt in SNF 05/22/2019 (all day) Addresses safety concerns and details of processing required for etch. Each etch will require PROM committee notification. Approved for this use only. Please see process staff for details
Lampoly Etch of Si on Si/SiO2/Metal/Glass Substrates 04/28/2019 (all day) Request for processing of metal containing wafers on semiclean lampoly tool. Lam Research TCP 9400 Poly Etcher (lampoly) Approved.
Use of InP Quantum Dots and Developer 04/25/2019 (all day) Request for processing of new InP Quantum Dot material and the associated developer. Request approved. Please see process staff for details.

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