PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
---|---|---|---|---|
Use of EKC 265 in SNF | 10/18/2018 | Processing details, storage, and disposal information detailed for SNF. | Request approved. Please see process staff for details. | |
1200OS Primer in Room 155 | 10/18/2018 | Use of 1200OS Primer in ExFab Mavericks | Request approved. Please see process staff for details. | |
Using Clean Furnace After Semi-Clean Chamber Etch | 10/10/2018 | Procedure to go from Berkeley Semi-Clean etcher into SNF Clean furnace | Request approved. | |
Nafion 117 solution dispersion in SNF | 10/04/2018 | Use of Nafion in ExFab wet bench | Headway 3 Manual Resist Spinner (headway3) | Request approved. |
Brewer Science Protective coatings for LIGO MEMS process | 10/04/2018 | Use of LIGO as hardmask for MEMS process. | Request approved. | |
HD Microsystems PI-2574 and HD-8820 Polyimide precursors and VM-651 adhesion promoter | 09/13/2018 | Bring in chemicals for use in SNF wet benches. | Headway Manual Resist Spinner (headway2) | Request approved. |
ALD of WO3 in Fiji3 | 09/11/2018 | Proposal to allow WO3, which is a non-standard film on Fiji3 to take advantage of the boost capability. | Fiji 3 ALD (fiji3) | Request approved with ICPMS contamination collection. Data review is appended. |
Process for using the AJA Evaporator in a Semiclean Fashion | 08/20/2018 | Procedure documentation of use of the flexible AJA cleanliness category in a semiclean manner. |
AJA Evaporator (aja-evap), Lam Research TCP 9400 Poly Etcher (lampoly) |
Request approved. |
Lampoly HBr/Cl2/O2 etching of silicon oxide on lithium niobate | 08/18/2018 | Request to introduce LiN into a clean category etcher. |
PlasmaTherm Shuttlelock PECVD System (ccp-dep), Lam Research TCP 9400 Poly Etcher (lampoly) |
Request approved. VPD Analysis complete. |
Use of NH4Cl in SNF | 08/15/2018 | Use of 5% Ammonium Chloride mixture in wbflexcorr. | Request approved. Please see process staff for details. |