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ProM Request archive

This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
Use of EKC 265 in SNF 10/18/2018 Processing details, storage, and disposal information detailed for SNF. Request approved. Please see process staff for details.
1200OS Primer in Room 155 10/18/2018 Use of 1200OS Primer in ExFab Mavericks Request approved. Please see process staff for details.
Using Clean Furnace After Semi-Clean Chamber Etch 10/10/2018 Procedure to go from Berkeley Semi-Clean etcher into SNF Clean furnace Request approved.
Nafion 117 solution dispersion in SNF 10/04/2018 Use of Nafion in ExFab wet bench Headway 3 Manual Resist Spinner (headway3) Request approved.
Brewer Science Protective coatings for LIGO MEMS process 10/04/2018 Use of LIGO as hardmask for MEMS process. Request approved.
HD Microsystems PI-2574 and HD-8820 Polyimide precursors and VM-651 adhesion promoter 09/13/2018 Bring in chemicals for use in SNF wet benches. Headway Manual Resist Spinner (headway2) Request approved.
ALD of WO3 in Fiji3 09/11/2018 Proposal to allow WO3, which is a non-standard film on Fiji3 to take advantage of the boost capability. Fiji 3 ALD (fiji3) Request approved with ICPMS contamination collection. Data review is appended.
Process for using the AJA Evaporator in a Semiclean Fashion 08/20/2018 Procedure documentation of use of the flexible AJA cleanliness category in a semiclean manner. AJA Evaporator (aja-evap),
Lam Research TCP 9400 Poly Etcher (lampoly)
Request approved.
Lampoly HBr/Cl2/O2 etching of silicon oxide on lithium niobate 08/18/2018 Request to introduce LiN into a clean category etcher. PlasmaTherm Shuttlelock PECVD System (ccp-dep),
Lam Research TCP 9400 Poly Etcher (lampoly)
Request approved. VPD Analysis complete.
Use of NH4Cl in SNF 08/15/2018 Use of 5% Ammonium Chloride mixture in wbflexcorr. Request approved. Please see process staff for details.

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