This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Procedure for use of diced wafers in Drytek2 | 11/05/2018 (all day) | Procedure to put diced wafers into Clean etcher |
Epilog Fusion M2 Laser Cutter (lasercutter), SNSF Flipscribe |
Request approved. |
| Recovery Procedure for Gasonics after Gold Contaminated wafer was processed. | 11/05/2018 (all day) | Documented here for staff reference- accidentally processed gold contaminated wafer was processed through clean gasonics tool. | Ask staff to see google drive for details. | |
| Etch of LiNb in PT-MTL | 10/30/2018 (all day) | Safely processing LiNb through PT-MTL etcher | Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) | Request approved. |
| Water_IPA mixture storage and use | 10/26/2018 (all day) | Storage and use of water IPA mixture in SNF. | Request approved. | |
| 1200OS Primer in Room 155 | 10/18/2018 (all day) | Use of 1200OS Primer in ExFab Mavericks | Request approved. Please see process staff for details. | |
| Use of EKC 265 in SNF | 10/18/2018 (all day) | Processing details, storage, and disposal information detailed for SNF. | Request approved. Please see process staff for details. | |
| Using Clean Furnace After Semi-Clean Chamber Etch | 10/10/2018 (all day) | Procedure to go from Berkeley Semi-Clean etcher into SNF Clean furnace | Request approved. | |
| Nafion 117 solution dispersion in SNF | 10/04/2018 (all day) | Use of Nafion in ExFab wet bench | Headway 3 Manual Resist Spinner (headway3) | Request approved. |
| Brewer Science Protective coatings for LIGO MEMS process | 10/04/2018 (all day) | Use of LIGO as hardmask for MEMS process. | Request approved. | |
| HD Microsystems PI-2574 and HD-8820 Polyimide precursors and VM-651 adhesion promoter | 09/13/2018 (all day) | Bring in chemicals for use in SNF wet benches. | Headway Manual Resist Spinner (headway2) | Request approved. |