ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Request to use Transene Niobium Etchant | 11/13/2017 | Transene Niobium Etchant will be used in the SNF. | Request approved. Please see process staff for details. | |
| Request to use poly-l-lysine to functionalize substrates prior to aerosol-jet printing | 11/09/2017 | Use of poly-l-lysine in Room 155 then bringing to 155A for Optomec printing. | Optomec Printer (optomec-printer) | Request approved. |
| Ferric Chloride Nickel Etch | 10/31/2017 | Mix Ferric Chloride solution in nSiL, process in SNF. | Request approved. | |
| Slurry with Periodic Acid | 10/20/2017 | Create slurry formulations with periodic acid for Pt CMP. | CMP GnP POLI-400L (cmp) | Request approved. |
| Annealing of 1 cm2 GaAs Chip at 350 C in RTA | 10/12/2017 | Calculations performed to quanitfy exposure risk to As gas. |
RTA AllWin 610 (aw610_l), RTA AllWin 610 (aw610_r) |
Request approved. |
| Cleovis P VPCH 8000 | 10/06/2017 | Proposal to use Clevios, a form of PEDOT in the SNF | Request approved. Please see process staff for details. | |
| Use of sol gel inks in Optomec | 10/05/2017 | Proposal to use solvent based inks in Optomoec printer. | Optomec Printer (optomec-printer) | Request rejected due to safety concerns. |
| PT-MTL use for semiclean etch | 09/26/2017 | Use of contaminated PT-MTL tool for semiclean Al etch. | Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) | Request approved. |
| Coating BPSG and PSG on InAs or GaAs | 09/25/2017 | Proposed process flow and precautions for processing these materials. | Request approved. Please see process staff for details. | |
| Nanodiamond Seeding | 08/17/2017 | Proposed process flow for nanodiamond seeding. | Request approved. Please see process staff for details. |
