This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Ni foam use in Graphene Furnace | 10/25/2016 (all day) | Use of Ni foam as substrate in graphene furnace. | Aixtron Black Magic graphene CVD furnace (aixtron-graphene) | Approved. |
| Use of Surfactant 1ATC9 for eGaIn sonication | 10/24/2016 (all day) | Use of 1ATC9 for sonication of solution to make eGaIn ink to use in Dimatix nano-ink jet printer. |
Fujifilm Dimatix Ink Jet Printer (nanoinkjet), QSonica Q700 Sonicator (sonicator) |
Approved. |
| Use of surfactant 1-dodecanethiol for eGaIn Sonication | 10/24/2016 (all day) | Use of 1-dodecanethiol for sonication of solution to make eGaIn ink to use in Dimatix nano-ink jet printer. |
Fujifilm Dimatix Ink Jet Printer (nanoinkjet), Probe Sonicator |
Approved. |
| Solder Paste and Spheres for Finetech Bonding | 10/12/2016 (all day) | Use of Pb-containing paste and spheres for soldering using Finetech Flip Chip Bonder. | Finetech Lambda (flipchipbonder) | Approved. Use of portable HEPA filter required due to Pb-containing materials. |
| NeverWet Hydrophobic Coating for use in nSiL | 10/05/2016 (all day) | NeverWet Hydrophobic Coating to be used in nSiL lab. SOP generated. | PDMS Spin Coater (spincoat-g3p8) | Approved. |
| Spin coating of ladder polymer on silicon chips | 09/13/2016 (all day) | Polymer synthesized in Prof. Xia's group (Chemistry) to be spin coated in SNF. | Approved for spin coater in CMP room. | |
| Use of Cr(OH)3 in SNF | 09/02/2016 (all day) | Use of Cr(OH)3 slurry in Laurell-G. |
SVG Resist Coat Track 1 (svgcoat), Karl Suss MA-6 Contact Aligner (karlsuss), SVG Develop Track 1 (svgdev), Laurell-G |
Approved. |
| UHV Al sputtering for processing in SNF | 08/19/2016 (all day) | Documenting processing for clean Al deposition in post-Gryphon SNF tool era. | Approved. | |
| Evaluation of Fiji Plasma Damage | 08/17/2016 (all day) | Material request to evaluate Fiji plasma system for damage. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for details. | |
| ALD oxides in teos2 | 08/04/2016 (all day) | High quality oxides from teos2 required for devices, so contamination mitigation plan proposed to allow ALD films from Fiji1 to process in clean teos2. | Fiji 1 ALD (fiji1) | Approved. |