ALD oxides in teos2
PROM Request Title:
ALD oxides in teos2
PROM Request Summary:
High quality oxides from teos2 required for devices, so contamination mitigation plan proposed to allow ALD films from Fiji1 to process in clean teos2.
PROM Date:
08/04/2016
PROM Decision:
Approved.
Link to PROM Request and supporting documentation:
Equipment List:
