PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
---|---|---|---|---|
Bring in and Store negative e-beam resist developer AR300-46 | 12/20/2019 | Request for developer to be used and stored in SNF. | Request approved. Please see process staff for details. | |
Wet Etch of BTO Thin Film Using DHF | 12/17/2019 | Wet etch of unique film in SNF. | Request approved. Please see process staff for details. | |
Sugar layer processing. | 12/12/2019 | Spin coat and baked in other lab, brought into SNF for measurement. | Request approved. Please see process staff for details. | |
Annealing of 1cm2 GaAs chip at 400C and 450C in RTA | 12/10/2019 | Request to anneal GaAs in RTA. Similar to Xue Bai's original request. Documenting for As gas safety purposes. | RTA AllWin 610 (aw610_l) | Approved. |
Request to expose pre-coated S1813 resist in SNF | 12/05/2019 | Request to expose glass slides with S1813 resist in Karl Suss and develop in SNF. | Request approved. Please see process staff for details. | |
Bring in and Store negative e-beam resists ma-N 2403, AR-N 7520 | 11/25/2019 | Request for new ebeam resists to be used in the Laurell only. | Request approved. Please see process staff for details. | |
Bring in_Store negative e-beam resists ma-N 2403, AR-N 7520 | 11/25/2019 | Request for new ebeam resists to be used in the Laurell only. | ||
AZ n LoF2020 in SNF headway | 11/20/2019 | Request for new photoresist to be used in Headway. |
Headway Manual Resist Spinner (headway2), Karl Suss MA-6 Contact Aligner (karlsuss), Wet Bench Miscellaneous (wbmiscres) |
Approved. |
Use of Stycast Epoxy for Non-galvanic Flip-chip Bonding | 11/15/2019 | Documentation of procedure to use epoxy in flip-chip bonder. | Wet Bench Miscellaneous (wbmiscres) | Approved. |
Introduction of Ni into Intlvac ebeam evaporator | 11/15/2019 | Request to add new metal to clean/semiclean evaporator. | Intlvac Evaporator (Intlvac_evap) | Request approved. Please see process staff for details. |