This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
SnO2 target for use in ExFab Lesker 03/13/2020 (all day) New target for use in SNF (ExFab) Lesker Lesker Sputter (lesker-sputter) Approved.
Thick ALD Titania in Savannah 03/12/2020 (all day) Request to deposit thicker than maximum allowed TiO2 layer Savannah ALD (savannah) Approved.
Use of NR26-1200PY in SNF 03/12/2020 (all day) Requst to bring new negative photoresist into SNF Headway Manual Resist Spinner (headway2),
Karl Suss MA-6 Contact Aligner (karlsuss),
Wet Bench Miscellaneous (wbmiscres)
Approved.
DuPont Polyimide FDLP C210 on headway2, Micromist coater, and Blue M Oven 03/11/2020 (all day) New PI for use in the cleanroom. Oven BlueM 200°C to 430°C (bluem),
Headway Manual Resist Spinner (headway2)
Request approved. Please see process staff for details.
Use of Parylene D in parcoater 03/11/2020 (all day) Use of a new Parylene in Mavericks PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater) Request approved. Please see process staff for details.
NuSiL MED 6019 and MED 4924 and MED 4950 in Mavericks 03/10/2020 (all day) Use of new materials in Mavericks. Wet Bench Miscellaneous (wbmiscres) Request approved.
Ion gel encapsulation in MVD 03/06/2020 (all day) Introduction of an ion gel material into MVD MVD (mvd) Request approved.
Bring Titanium Etchant TFTN to use in SNF 02/26/2020 (all day) Use of new chemistry for Ti Etch in SNF. Request approved. Please see process staff for details.
2020026 Bring Titanium Etchant TFTN to use in SNF 02/26/2020 (all day) Use of new chemistry for Ti Etch in SNF. Approved.
InSe into SNF 02/24/2020 (all day) Request to bring new 2D material for processing in specific SNF tools. Headway Manual Resist Spinner (headway2),
Heidelberg MLA 150 - 2 (heidelberg2),
AJA Evaporator (aja-evap)
Request approved with local waste collection.

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