ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Use of InP substrate in Fiji1 | 11/15/2019 | Request documenting procedures to use InP substrate in Fiji1 (semiclean) | Fiji 1 ALD (fiji1) | Request approved. Please see process staff for details. |
| Use of Parylene N in parcoater | 11/11/2019 | Request to use alternate Parylene type | PDS 2010 LABCOTER™ 2 Parylene Deposition System (parcoater) | Approved. |
| NOA89 use in SNF litho area | 11/07/2019 | Request to bring new chemistry into SNF litho area |
Karl Suss MA-6 Contact Aligner (karlsuss), Headway Manual Resist Spinner (headway2) |
Approved. |
| Request to bring in baked KrF resist into ExFab | 10/24/2019 | Request to bring new materials into ExFab. | Request approved. Please see process staff for details. | |
| Request to use TechniEtch CR01 in SNF | 10/10/2019 | Request to use perchloric acid containing chemistry in SNF. | Request approved. Please see process staff for details. | |
| Request to use EKC 265 in SNF | 10/10/2019 | Documented protocol for using EKC265 in SNF. | Approved. | |
| Request to use KMPR 1025 resist on Heidelberg | 10/09/2019 | Detailed procedure identified to allow KMPR 1025 resist on the Heidelberg. |
Heidelberg MLA 150 - 2 (heidelberg2), Headway Manual Resist Spinner (headway2), SVG Resist Coat Track 1 (svgcoat) |
Approved. |
| Request to cure Zeocoat CP1010-14 in BlueM oven | 10/08/2019 | Process modification to allow processing in Blue M oven vs white oven. | Oven BlueM 200°C to 430°C (bluem) | Request approved. Please see process staff for details. |
| Introduction of EBR PG Wash Bottle for litho solvent bench | 08/20/2019 | Documenting new chemistry that will be stocked by SNF. |
Laurell Manual Resist Spinner (laurell-R), Wet Bench Solvent Lithography (lithosolv), Headway Manual Resist Spinner (headway2) |
Approved. |
| Request for Bi-Sb-Te dry etch Ox-35 using Methane-H2 | 08/13/2019 | Technical concerns discussed and contamination evaluation plans are documented. | Oxford III-V etcher (Ox-35) | Dropped by requestor. Please see process staff for details. |
