ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| HF wet etch to peel off PMMA film embedding graphene composites | 02/23/2015 | Request to use wb-flexcorr to undercut and remove film with encpsulated graphene oxide particles. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Request approved. |
| PbS in Fiji3 | 02/20/2015 | Request to use Fiji3 for processing of PbS films on carrier wafer. | Fiji 3 ALD (fiji3) | Request approved. As long as carrier wafer is used, processing on Fiji3 permitted even after Fiji2 is up. |
| Ultrasol 201A CMP Slurry | 02/19/2015 | Request to use new slurry for Al CMP in SNF. | CMP GnP POLI-400L (cmp) | Request approved. Slurry storage will not be in CMP room. |
| Al2O3 ALD on K(Co)-doped BaFe2As2 | 02/18/2015 | Request to introduce new materials into SNF. | Fiji 3 ALD (fiji3) | Request approved for Fiji2 at temperatures below 180C. |
| Ladder Polymers and Solvent | 02/18/2015 | Request to pattern and etch polymer film inside the SNF. Polymer deposition and solvent usage to be performed OUTSIDE the SNF. | Request approved. Dedicated glassware required. | |
| Annealing Thulium doped samples | 02/13/2015 | Request to anneal Thulium doped samples in tylan 9 and aw150-r. | Tylan9 Forming Gas Anneal Furnace (tylan9) | Request approved. Oxidation cycle required after anneal in furnace. |
| SiO2 films on Si wafers soaked in IPA solvent | 02/13/2015 | Request to bring wet samples soaked in IPA into the SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. | |
| Lampoly HBr/Cl2/O2 etching of silicon on lithium niobiate | 02/07/2015 | Request to introduce lithium niobiate substrate into SNF etchers. | Lam Research TCP 9400 Poly Etcher (lampoly) | Pending contamination study documentation. |
| Contamination Study of Semi-Clean SiGe in LAMpoly | 02/02/2015 | Request to perform contamination study of Semi-Clean SiGe in LAMpoly. |
Lam Research TCP 9400 Poly Etcher (lampoly), CMP GnP POLI-400L (cmp) |
Approved for study. Resubmission is required after data is collected. // Update 2/18/15: TiN layer deposition at Berkeley is approved due to extended Fiji1 downtime. // Update 3/31/15: Contamination data appended. Process flow is approved. |
| Use of toluene at Headway | 01/15/2015 | Request to use toluene in SNF. | Headway Manual Resist Spinner (headway2) | Approved. Even though there will be no chemical storage in the SNF, chemicals must be logged and a yellow sticker placed on the bottle while in use in the SNF. |
