Dichlorosilane processing on Fiji1 |
09/22/2014 |
Request to use DCS precursor on Fiji1. |
Fiji 1 ALD (fiji1) |
Approved with modifications. Clarifications regarding DCS monitoring during processing added. |
PS-OH use in SNF |
09/18/2014 |
Request to use PS-OH polymer in SNF. |
Headway Manual Resist Spinner (headway2) |
Approved. |
UV Cured adhesive use |
08/29/2014 |
Request to use NOA89 or NOA75 in SNF. |
|
Approved. |
Ionic Liquid on Woollam |
08/13/2014 |
Request to use measure non-hazardous liquid electrolyte on Woollam. |
Woollam (woollam) |
Approved. Required to use a cap covered cuvette to transfer liquid across the lab. |
PS-PMMA use in SNF |
08/12/2014 |
Request to use PS-PMMA in SNF tools. |
Headway Manual Resist Spinner (headway2) |
Approved. |
PGMEA use in SNF |
08/12/2014 |
Request to use PGMEA in SNF tools. |
Headway Manual Resist Spinner (headway2) |
Approved. |
Etching Cytop 809M in PT-MTL |
07/25/2014 |
Request to etch Cytop spin on glass in PT-MTL etcher. |
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) |
Approved. PT-Ox recommended due to CHF3 availability but material is approved for PT-MTL. |
Etching T12B SOG in Pt-Ox |
07/25/2014 |
Request to etch T12B spin on glass in PT-OX etcher. |
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox) |
Approved. |
Etching T12B SOG in PT-MTL |
07/25/2014 |
Request to etch T12B spin on glass in PT-MTL etcher. |
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) |
Approved. PT-Ox recommended due to CHF3 availability but material is approved for PT-MTL. |
Etching FOx-22 in PT-Ox |
07/25/2014 |
Request to etch FOx-22 spin on glass in PT-OX etcher. |
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox) |
Approved. |