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ProM Request archive

This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
HMDS for Cypress HX3 Lead Frame 11/01/2014 Request for YES oven recipe skews. Approved.
ALD film thickness 150nm 10/31/2014 Request to deposit 150nm of ALD film (upper limit is 50nm). Fiji 3 ALD (fiji3) Approved.
Oxalic acid in the SNF 10/28/2014 Request to use oxalic acid in the SNF. Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information.
Nb etch in PT-Metal 10/21/2014 Request to use PT Metal to etch Nb. Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) Approved.
PI2611 and PI2610 use in SNF 10/15/2014 Request to use PI2611 and 2610 in SNF. Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information.
Polyimide MLD 10/13/2014 Request to use MVD to develop polyimide film deposition. Savannah ALD (savannah),
Fiji 2 ALD (fiji2)
Approved.
CCP PECVD on FOx-22 SOG 10/10/2014 Request to deposit dielectric material using CCP PECVD on FOx-22 SOG. PlasmaTherm Shuttlelock PECVD System (ccp-dep) Approved.
CCP PECVD on CYTOP 809M 10/10/2014 Request to deposit dielectric material using CCP PECVD on CYTOP 809M SOG. PlasmaTherm Shuttlelock PECVD System (ccp-dep) Approved.
InAs on GaAs piece in Fiji2 and Savannah 10/07/2014 Request to process InAs deposited on GaAs in gold-contamination ALD tools (Savannah and Fiji2). Fiji 2 ALD (fiji2),
Savannah ALD (savannah)
Approved for documented quantities. Pieces need to cool in load lock before retrieval on Fiji2.
Etching Y on MoS2 substrate at wbflexcorr 10/07/2014 Request to etch Y at wbflexcorr. Wet Bench Flexcorr 1 (wbflexcorr-1) Approved for documented quantities. Re-approval required if quantities change.

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