This is an archive of requests from 2013 to 2021. New requests are not being added here.
PROM Request Title PROM Date PROM Request Summary Equipment List PROM Decision
Request for 150nm ALD film 11/06/2014 (all day) Request to deposit 150nm Al2O3 in ALD. Fiji 3 ALD (fiji3) Rejected due to insufficient information regarding requirement for ALD vs. other deposition methods.
Polymers 575771 and 593052 use in SNF 11/06/2014 (all day) Request to use Poly(pyromellitic dianhydride-co-4,4′-oxydianiline), amic acid solution (575771) and Poly(pyromellitic dianhydride-co-4,4′-oxydianiline), amic acid solution (593052) in the SNF. Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information.
Metal CMP 11/05/2014 (all day) Request to use CMP to polish gold. Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE) Approved.
Mesitylene in SNF 11/05/2014 (all day) Request to use Mesitylene in SNF. Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information.
HMDS for Cypress HX3 Lead Frame 11/01/2014 (all day) Request for YES oven recipe skews. Approved.
ALD film thickness 150nm 10/31/2014 (all day) Request to deposit 150nm of ALD film (upper limit is 50nm). Fiji 3 ALD (fiji3) Approved.
Oxalic acid in the SNF 10/28/2014 (all day) Request to use oxalic acid in the SNF. Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information.
Nb etch in PT-Metal 10/21/2014 (all day) Request to use PT Metal to etch Nb. Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) Approved.
PI2611 and PI2610 use in SNF 10/15/2014 (all day) Request to use PI2611 and 2610 in SNF. Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information.
Polyimide MLD 10/13/2014 (all day) Request to use MVD to develop polyimide film deposition. Savannah ALD (savannah),
Fiji 2 ALD (fiji2)
Approved.

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