ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| HMDS for Cypress HX3 Lead Frame | 11/01/2014 | Request for YES oven recipe skews. | Approved. | |
| ALD film thickness 150nm | 10/31/2014 | Request to deposit 150nm of ALD film (upper limit is 50nm). | Fiji 3 ALD (fiji3) | Approved. |
| Oxalic acid in the SNF | 10/28/2014 | Request to use oxalic acid in the SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. | |
| Nb etch in PT-Metal | 10/21/2014 | Request to use PT Metal to etch Nb. | Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL) | Approved. |
| PI2611 and PI2610 use in SNF | 10/15/2014 | Request to use PI2611 and 2610 in SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. | |
| Polyimide MLD | 10/13/2014 | Request to use MVD to develop polyimide film deposition. |
Savannah ALD (savannah), Fiji 2 ALD (fiji2) |
Approved. |
| CCP PECVD on FOx-22 SOG | 10/10/2014 | Request to deposit dielectric material using CCP PECVD on FOx-22 SOG. | PlasmaTherm Shuttlelock PECVD System (ccp-dep) | Approved. |
| CCP PECVD on CYTOP 809M | 10/10/2014 | Request to deposit dielectric material using CCP PECVD on CYTOP 809M SOG. | PlasmaTherm Shuttlelock PECVD System (ccp-dep) | Approved. |
| InAs on GaAs piece in Fiji2 and Savannah | 10/07/2014 | Request to process InAs deposited on GaAs in gold-contamination ALD tools (Savannah and Fiji2). |
Fiji 2 ALD (fiji2), Savannah ALD (savannah) |
Approved for documented quantities. Pieces need to cool in load lock before retrieval on Fiji2. |
| Etching Y on MoS2 substrate at wbflexcorr | 10/07/2014 | Request to etch Y at wbflexcorr. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Approved for documented quantities. Re-approval required if quantities change. |
