This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Clean Processing of Aluminum post CMP | 02/21/2014 (all day) | Clean contamination category processing of Aluminum post CMP. Requires Al compatible clean (standard decon procedure includes SC2 which etches Al). |
PlasmaTherm Shuttlelock PECVD System (ccp-dep), CMP GnP POLI-400L (cmp) |
Approved to use the standard metal clean for post CMP clean and CCP or HD CVD oxide tools in clean contamination state. |
| Tantalum Sputter Target for Metallica | 02/19/2014 (all day) | Request to introduce Ta target for Metallica. | Approved. Process parameters to be developed with J. Conway. | |
| Spin coat substrates with graphene | 02/11/2014 (all day) | Request to use Headway spinner in SNF to spin coat graphene particles on substrates. |
Headway Manual Resist Spinner (headway2), Laurell Manual Resist Spinner (laurell-R) |
Approved for Laurell spinner OUTSIDE of SNF. No loose nanoparticles to be spun inside of cleanroom. |
| Mercury Cadmium Telluride on a Zinc Cadmium Telluride Substrate | 02/07/2014 (all day) | Request for HgCdTe on ZnCdTe substrate for use in e-beam lithography. | Headway Manual Resist Spinner (headway2) | Approved. |
| Request for use of HD Microsystems PI-2611 and VM-651 | 02/05/2014 (all day) | Request to bring new chemistries in for Poly Imide processing. | Approved. | |
| Epoxy Permanent Resists from Microchem, version 174 | 02/04/2014 (all day) | Request for use of MicroChem Epoxy Permanent Resist version 174. | Headway Manual Resist Spinner (headway2) | Approved. Any changes to documented request will require re-evaluation by committee. |
| Request for use of EPR-174 | 02/04/2014 (all day) | Headway Manual Resist Spinner (headway2) | Approved. | |
| Use of Strontium Titanate Single Crystal substrate in CPD | 01/31/2014 (all day) | Inquiry to PROM committee. | Approved. | |
| Use of Filmtronics P507 SOD for Ge(Sn) epi on Si | 01/23/2014 (all day) | Request to bring new SOD into SNF. | Headway Manual Resist Spinner (headway2) | Approved. |
| Process flow to go from PT-DSE (contaminated) to epi2 (clean) | 01/21/2014 (all day) | Process flow change request to go from contaminated to clean equipment (in violation of contmaination policy). | AMAT Centurion Epitaxial System (epi2) | Rejected. Further follow up from requester required. |