PROM Request Title:
Clean Processing of Aluminum post CMP
PROM Request Summary:
Clean contamination category processing of Aluminum post CMP. Requires Al compatible clean (standard decon procedure includes SC2 which etches Al).
PROM Date:
02/21/2014 (all day)
PROM Decision:
Approved to use the standard metal clean for post CMP clean and CCP or HD CVD oxide tools in clean contamination state.
Link to PROM Request and supporting documentation: