ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Initial Characterization of Cyclotene XUS 35077.00 Type 02 Resin | 01/07/2015 | Request to use Cyclotene XUS Resin in SNF. | Approved. Until refrigerator is available in the cleanroom, temporary storage offered in refrigerator in chemical store room. // Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information | |
| Diamine (DAH) Precursor for MLD of Polymers | 12/04/2014 | Request for new precursor for MVD. | Savannah ALD (savannah) | Approved. |
| Constantan (0.55Cu-0.45Ni) sputtering target for Metalica | 11/19/2014 | Request for new Metallica target. | Approved. | |
| Contamination Study of ZnO Anneal | 11/18/2014 | Request to collect data to determine impact of ZnO anneal in furnaces. | Savannah ALD (savannah) | Approved. Data will be updated once results are back. |
| use of dry film photoresist (MX5015) with developer (0.75wt% potassium carbonate) and remover (EKC-162) | 11/11/2014 | Request to use alternate dry film photoresist and developer. Potassium carbonate handling requires specific safety precautions. | Headway Manual Resist Spinner (headway2) | Approved. Any changes to location or quantities need review. |
| PT-DSE to CLEAN contamination process flow | 11/06/2014 | Request to process materials in CLEAN process equipment after PT-DSE. This requires a change in contamination policy. | AMAT Centurion Epitaxial System (epi2) | Conditional approval. Data must be analyzed before final approval. |
| Request for 150nm ALD film | 11/06/2014 | Request to deposit 150nm Al2O3 in ALD. | Fiji 3 ALD (fiji3) | Rejected due to insufficient information regarding requirement for ALD vs. other deposition methods. |
| Polymers 575771 and 593052 use in SNF | 11/06/2014 | Request to use Poly(pyromellitic dianhydride-co-4,4â²-oxydianiline), amic acid solution (575771) and Poly(pyromellitic dianhydride-co-4,4â²-oxydianiline), amic acid solution (593052) in the SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. | |
| Metal CMP | 11/05/2014 | Request to use CMP to polish gold. | Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE) | Approved. |
| Mesitylene in SNF | 11/05/2014 | Request to use Mesitylene in SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. |
