This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| SiO2 films on Si wafers soaked in IPA solvent | 02/13/2015 (all day) | Request to bring wet samples soaked in IPA into the SNF. | Approved. Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information. | |
| Lampoly HBr/Cl2/O2 etching of silicon on lithium niobiate | 02/07/2015 (all day) | Request to introduce lithium niobiate substrate into SNF etchers. | Lam Research TCP 9400 Poly Etcher (lampoly) | Pending contamination study documentation. |
| Contamination Study of Semi-Clean SiGe in LAMpoly | 02/02/2015 (all day) | Request to perform contamination study of Semi-Clean SiGe in LAMpoly. |
Lam Research TCP 9400 Poly Etcher (lampoly), CMP GnP POLI-400L (cmp) |
Approved for study. Resubmission is required after data is collected. // Update 2/18/15: TiN layer deposition at Berkeley is approved due to extended Fiji1 downtime. // Update 3/31/15: Contamination data appended. Process flow is approved. |
| Use of toluene at Headway | 01/15/2015 (all day) | Request to use toluene in SNF. | Headway Manual Resist Spinner (headway2) | Approved. Even though there will be no chemical storage in the SNF, chemicals must be logged and a yellow sticker placed on the bottle while in use in the SNF. |
| Initial Characterization of Cyclotene XUS 35077.00 Type 02 Resin | 01/07/2015 (all day) | Request to use Cyclotene XUS Resin in SNF. | Approved. Until refrigerator is available in the cleanroom, temporary storage offered in refrigerator in chemical store room. // Please contact PROM Committee (snf-promcommittee at lists dot stanford dot edu) for more information | |
| Diamine (DAH) Precursor for MLD of Polymers | 12/04/2014 (all day) | Request for new precursor for MVD. | Savannah ALD (savannah) | Approved. |
| Constantan (0.55Cu-0.45Ni) sputtering target for Metalica | 11/19/2014 (all day) | Request for new Metallica target. | Approved. | |
| Contamination Study of ZnO Anneal | 11/18/2014 (all day) | Request to collect data to determine impact of ZnO anneal in furnaces. | Savannah ALD (savannah) | Approved. Data will be updated once results are back. |
| use of dry film photoresist (MX5015) with developer (0.75wt% potassium carbonate) and remover (EKC-162) | 11/11/2014 (all day) | Request to use alternate dry film photoresist and developer. Potassium carbonate handling requires specific safety precautions. | Headway Manual Resist Spinner (headway2) | Approved. Any changes to location or quantities need review. |
| PT-DSE to CLEAN contamination process flow | 11/06/2014 (all day) | Request to process materials in CLEAN process equipment after PT-DSE. This requires a change in contamination policy. | AMAT Centurion Epitaxial System (epi2) | Conditional approval. Data must be analyzed before final approval. |