Tystar Bank 3 Tube 11 TEOS B3T11 Clean TEOS |
Tystar LPCVD Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
|
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly |
Tystar LPCVD Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
|
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Tystar Atmospheric Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
|
Wet Bench Clean 1 wbclean-1 |
Wet Bench Clean1and2 Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha.
|
Wet Bench Clean 2 wbclean-2 |
Wet Bench Clean1and2 Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha
|
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Wet Bench Clean Piranha/HF/Phosphoric Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
Resist should have been removed
|
Wet Bench Clean_res-hf wbclean_res-hf |
Wet Bench Clean Piranha/HF/Phosphoric Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
Resist as mask allowed
|
Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean Piranha/HF/Phosphoric Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
Resist will be removed
|
Wet Bench CMOS Metal wbclean3 |
Wet Bench CMOS Metal (wbclean3) Training |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
Al, Ti, or W wet etching or oxide etching
|
Wet Bench Decontamination wbdecon |
Wet Bench Decontamination Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
KOH or wafersaw or post-cmp decontamination
|
Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
|
Wet Bench Flexcorr 2 wbflexcorr-2 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only
|
Wet Bench Flexcorr 3 wbflexcorr-3 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.
|
Wet Bench Flexible Solvents wbflexsolv |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual solvent cleaning of substrates or resist removal.
|
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual solvent cleaning, two ultrasonic baths.
|
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual solvent cleaning, hot plate
|
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!
|
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip |
Clean (Ge), Semiclean, Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Resist Removal: SRS-100 or PRS1000
|
Wet Bench Solvent Lithography lithosolv |
Lithography Solvent Bench Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
|
Woollam woollam |
Woollam Training |
All |
SNF Cleanroom Paul G Allen L107 |
|