Skip to content Skip to navigation

Piranha Cleaning

Piranha Cleaning is used to refer to mixtures of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). There are various ratios and temperatures that can be used depending on what is being cleaned off and what your substrate can withstand. Pirhana cleans are often used to remove reisist, clean resist residues and post-etch sidewall polymer residues. Piranha cleans will also remove metals.

The specific wet bench you will need to use will depend on your substrate material, substrate size, other materials on your substrate, and the contamination level of your part. (For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page).

Technique Tabs

Subscribe to