Chemical Formula:
He
| Equipment name & NEMO ID | Cleanliness | Location | Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Lam Research TCP 9400 Poly Etcher lampoly |
SNF Paul G Allen L107 Cleanroom | ||||
|
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox |
SNF Paul G Allen L107 Cleanroom |
| Equipment name & NEMO ID | Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Oxford Plasma Pro PECVD Ox-PECVD |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
PlasmaTherm Shuttlelock PECVD System ccp-dep |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|