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Perfluorocyclobutane
Chemical Formula:
C
4
F
8
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
Plasma Therm Versaline LL ICP Deep Silicon Etcher
PT-DSE
Flexible
SNF Cleanroom Paul G Allen L107
Si
Ar
C
4
F
8
O
2
SF
6
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Flexible
SNF Cleanroom Paul G Allen L107
C
Si3N4
SiC
SiO
2
Various C-based
Ar
C
4
F
8
CF
4
CHF
3
H
2
He
N
2
O
2
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
