The following is a list of equipment where 2 inch round substrates are allowed.
Convection in N2. Cure. Programmable.
Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment.
500Å to 300µm
3 Probe Heads for different cleanliness groups.
non contact 3D optical profiling
Pieces need a carrier wafer; Isotropic Etching
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.