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Atomic Layer Deposition (ALD)

Atomic Layer Deposition (ALD) is used for depositing thin (<50nm) films that are highly conformal. Most of the films deposited are metal oxides, although we do have Pt and Ru metal films available as well. We have both thermal only systems and plasma-assisted sytems available for labmembers to use. 

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are:

  • a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
  • a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.

Technique Tabs

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