Chemical Formula:
CH4
| Equipment name & NEMO ID | Cleanliness |
Location |
Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Oxford III-V etcher Ox-35 |
SNF Paul G Allen L107 Cleanroom | ||||
|
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL |
SNF Paul G Allen L107 Cleanroom | ||||
|
Oxford Plasma Pro ICP-RIE Ox-gen |
SNF Paul G Allen L107 Cleanroom |
|
|
| Equipment name & NEMO ID | Cleanliness |
Location |
Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
PlasmaTherm Shuttlelock PECVD System ccp-dep |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
Oxford Plasma Pro PECVD Ox-PECVD |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
First Nano carbon nanotube CVD furnace cvd-nanotube |
SNF Exfab Paul G Allen L119 Año Nuevo | |||
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
SNF Exfab Paul G Allen L119 Año Nuevo |