Chemical Formula:
NH3
No equipment matches all of the filter criteria you have set above.
Equipment name & NEMO ID |
Cleanliness | Location | Material Thickness Range | Approved Materials supplied by Lab |
|---|---|---|---|---|
|
Aixtron MOCVD - III-N system aix-ccs |
SNF MOCVD Paul G Allen 213XA |
0.00 -
5.00 μm
|
||
|
Fiji 1 ALD fiji1 |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
||
|
Fiji 3 ALD fiji3 |
SNF Paul G Allen L107 Cleanroom |
1.00 Å -
50.00 nm
|
||
|
Oxford Plasma Pro PECVD Ox-PECVD |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
PlasmaTherm Shuttlelock PECVD System ccp-dep |
SNF Paul G Allen L107 Cleanroom |
100.00 Å -
4.00 μm
|
||
|
RTA AllWin 610 aw610_l |
SNF Paul G Allen L107 Cleanroom | |||
|
RTA AllWin 610 aw610_r |
SNF Paul G Allen L107 Cleanroom | |||
|
Tystar Bank 2 Tube 7 Nitride B2T7 Flexible Nitride |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|
||
|
Tystar Bank 3 Tube 10 Nitride B3T10 Clean Nitride |
SNF Paul G Allen L107 Cleanroom |
25.00 Å -
2.00 μm
|