Dry Resist Removal, Dry Etching |
Technics Asher technics |
Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Plasma Mode Etching, Reactive Ion Etching (RIE), Downstream/Remote Plasma Resist Removal |
Samco PC300 Plasma Etch System samco |
The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch or Downstream plasma modes
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Matrix Plasma Resist Strip matrix |
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Gasonics Aura Asher gasonics |
The Gasonics Aura Asher is an automated down stream microwave plasma system used for stripping photoresist of 4 inch wafers in the 'clean' cleanliness group.
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Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |