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Dry Resist Removal

Dry resist removal, called Ashing, uses O2 plasma to react with the resist to remove it from the substrate.

The asher you will need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).

Technique Tabs

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