Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly |
Flexible |
25.00 Å -
2.00 μm
|
420 °C - 630 °C
|
, , , , , |
100 | |||||||
Tystar Bank 1 Tube 4 LTO B1T4 Flexible LTO |
Flexible |
25.00 Å -
2.00 μm
|
300 °C - 500 °C
|
, , , , , |
100 | |||||||
Tystar Bank 2 Tube 5 B2T5 Clean Oxide Anneal |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | ||||||
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | ||||||
Tystar Bank 2 Tube 7 Nitride B2T7 Clean Nitride |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
420 °C - 800 °C
|
, , |
50 | ||||||
Tystar Bank 2 Tube 8 LTO B2T8 Clean LTO |
Clean |
25.00 Å -
2.00 μm
|
300 °C - 500 °C
|
, , |
100 | |||||||
Tystar Bank 3 Tube 10 Nitride B3T10 Clean Nitride |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
420 °C - 800 °C
|
, , |
50 | ||||||
Tystar Bank 3 Tube 11 TEOS B3T11 Clean TEOS |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
420 °C - 630 °C
|
, , |
50 | ||||||
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
420 °C - 630 °C
|
, , |
50 | ||||||
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | ||||||
Wet Bench Clean 1 wbclean-1 |
Clean |
, , |
25 | |||||||||
Wet Bench Clean 2 wbclean-2 |
Clean |
, , |
25 | |||||||||
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Clean |
, , |
||||||||||
Wet Bench Clean_res-hf wbclean_res-hf |
Clean |
, , |
||||||||||
Wet Bench Clean_res-piranha wbclean_res-piranha |
Clean |
, , |
||||||||||
Wet Bench CMOS Metal wbclean3 |
Semiclean |
, , |
25 wafers | |||||||||
Wet Bench Decontamination wbdecon |
Clean |
, , |
||||||||||
Wet Bench Flexcorr 1 wbflexcorr-1 |
|
Flexible |
, , , , , , , , , , |
|||||||||
Wet Bench Flexcorr 2 wbflexcorr-2 |
Flexible |
, , , , , , , , , , |
||||||||||
Wet Bench Flexcorr 3 wbflexcorr-3 |
Flexible |
, , , , , , , , , |