Silicon

To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -

Substrates in clean category: Pre-Diffusion Clean

For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run

500Å to 300µm

3 Probe Heads for different cleanliness groups.

non contact 3D optical profiling

Automatic development.

Automatic Resist spinning and bake