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Silicon Oxynitride

Chemical Formula: 
SiON

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Locationsort descending Material Thickness Range Approved Materials supplied by Lab
PlasmaTherm Shuttlelock PECVD System
ccp-dep
SNF Cleanroom Paul G Allen L107
100.00 Å - 4.00 μm
PlasmaTherm Versaline HDP CVD System
hdpcvd
SNF Cleanroom Paul G Allen L107
500.00 Å - 4.00 μm
Tystar Bank 3 Tube 10 Nitride
B3T10 Clean Nitride
SNF Cleanroom Paul G Allen L107
25.00 Å - 2.00 μm
Tystar Bank 2 Tube 7 Nitride
B2T7 Clean Nitride
SNF Cleanroom Paul G Allen L107
25.00 Å - 2.00 μm
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