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Silicon Carbide

Chemical Formula: 

Silicon carbide can deposited in the ccp system by the reaction between silane and methane.

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Locationsort descending Material Thickness Range Approved Materials supplied by Lab
PlasmaTherm Shuttlelock PECVD System
SNF Cleanroom Paul G Allen L107
100.00 Å - 4.00 μm
PlasmaTherm Versaline HDP CVD System
SNF Cleanroom Paul G Allen L107
500.00 Å - 4.00 μm
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