This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List | PROM Decision |
|---|---|---|---|---|
| Standard operating procedure for liquid electrochemical cell | 06/09/2021 (all day) | Request for group to purchase liquid electrochemical cell for Woollam, and documentation of procedures for installation and un-installation | Request approved. | |
| HD4110 photoresist and Cyclopenanone in SNF | 06/04/2021 (all day) | Request for new resist and solvent in SNF. | Request approved. | |
| TDUR Photoresist Use in SNF | 06/03/2021 (all day) | Request for new resist in SNF labs. | Request approved. Please see process staff for details. | |
| Request for use of hydrogel-based photoresist (NIPAM) | 05/25/2021 (all day) | Request for new resist formulation in SNF | Request approved. | |
| Nitric Acid and Sulfuric Acid for Oxygen Termination of Diamond | 05/20/2021 (all day) | Request for heated acid manual processing. | Request approved. | |
| Savannah Al2O3 ALD on samples with exposed BiFeO3 and SrRuO3 | 05/17/2021 (all day) | Request for non-standard materials in Savannah. | Savannah ALD (savannah) | Request approved. Please see process staff for details. |
| PT-DSE etching of silicon to undercut lithium niobate structures | 05/13/2021 (all day) | Request documenting data collection to enable LiNb processing on PT-DSE | Request approved | |
| 70-nm-thick Al2O3 ALD deposition by Fiji-1 in SNF | 05/13/2021 (all day) | Request for depositon that is thicker than allowed. | Request approved. | |
| Returning Si/SOI (Si-on-insulator) to Clean Group for CMOS FEOL after UV | 05/04/2021 (all day) | Cleanliness category exception documented. | Request approved. Please see process staff for details. | |
| Stress Testing with temperature cycling | 05/04/2021 (all day) | Request to use the temperature capabiities of the Flexus. | Flexus 2320 Stress Tester (stresstest) | Request approved. |