Coating is the term used to cover the substrate (wafer or piece) with a UV light sensitive film that is used to pattern the surface of the material. Spin coating is the most popular method.
| Processing Technique | Equipment name & NEMO ID | Cleanliness | Chemicals | Substrate Size | Maximum Load (number of wafers) | Resist | Notes | Stylus Tip Radius |
|---|---|---|---|---|---|---|---|---|
| Resist Spray Coat (manual) |
EVG 101 Spray Coater evgspraycoat |
"All" | 1 |
Spray coating of resists |
||||
| Resist Coat (manual) |
Headway 3 Manual Resist Spinner headway3 |
"All" | 1 piece or wafer | |||||
| Resist Coat (manual) |
Headway Manual Resist Spinner headway2 |
"All" | one piece or wafer |
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
||||
| Resist Coat (manual) |
Laurell Manual Resist Spinner laurell-R |
"All" |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |
|||||
| Resist Coat (automatic) |
SVG Resist Coat Track 1 svgcoat |
"All" | 25 4 inch wafers |
Automatic Resist spinning and bake |
||||
| Resist Coat (automatic) |
SVG Resist Coat Track 2 svgcoat2 |
"All" | 25 4 inch wafers |
Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal. |