Resist Exposure Equipment Summary
Resist Exposure Equipment
| Processing Techniques | Equipment name (NEMO ID) | Cleanliness |
Minimum Resolution |
Exposure Wavelength | Substrate Size | Mask Size | Notes |
|---|---|---|---|---|---|---|---|
| Stepper | ASML PAS 5500/60 i-line Stepper (asml) | "All" | 0.45 μm | 365 nm | 5 inch |
5:1 reducing stepper |
|
| Direct Write | Heidelberg MLA 150 - 2 (heidelberg2) | "All" | 0.60 μm | 375 nm |
Direct Write |
||
| Direct Write | Heidelberg MLA 150 (heidelberg) | "All" | 1.00 μm | 405 nm |
Direct Write |
||
| Contact Aligner | Karl Suss MA-6 Contact Aligner (karlsuss2) | "All" | 1.50 μm | 365 nm or 405 nm | 4 inch, 5 inch, 7 inch |
1:1 Contact Aligner. |
|
| Contact Aligner | Karl Suss MA-6 Contact Aligner (karlsuss) | "All" | 1.50 μm | 365 nm | 4 inch, 5 inch, 7 inch |
1:1 Contact Aligner. |
Last modified: 30 Apr 2020
