Processing Techniques Equipment name (NEMO ID) Cleanliness Developer Substrate Size Notes
Resist Develop (manual), Wet Chemical Processing Ex Fab Develop Wet Bench (wbexfab_dev) Flexible

Manual development of resist in beakers. SNF approved developers only. No solvents!
Resist Develop (automatic) SVG Develop Track 1 (svgdev) "All"

Automatic development.
Resist Develop (automatic) SVG Develop Track 2 (svgdev2) "All"

Automatic development.
Resist Develop (manual), Wet Chemical Processing Wet Bench Miscellaneous (wbmiscres) Flexible

Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!