Processing Techniques | Equipment name (NEMO ID) | Cleanliness | Developer | Substrate Size | Notes |
---|---|---|---|---|---|
Resist Develop (manual), Wet Chemical Processing | Ex Fab Develop Wet Bench (wbexfab_dev) | Flexible |
Manual development of resist in beakers. SNF approved developers only. No solvents! |
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Resist Develop (automatic) | SVG Develop Track 1 (svgdev) | All |
Automatic development. |
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Resist Develop (automatic) | SVG Develop Track 2 (svgdev2) | All |
Automatic development. |
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Resist Develop (manual), Wet Chemical Processing | Wet Bench Miscellaneous (wbmiscres) | Flexible |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |