Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
Nanospec 210XP nanospec2 |
Nanospec Training | All | SNF Exfab Paul G Allen 104 Stinson |
Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã |
SEM -Zeiss Merlin sem-merlin |
SEM-Merlin Training | All | SNF Exfab Paul G Allen 104 Stinson | |
Woollam woollam |
Woollam Training | All | SNF Cleanroom Paul G Allen L107 | |
Tencor P2 Profilometer p2 |
Tencor P2 Profilometer Training | Clean, Semiclean | SNF Cleanroom Paul G Allen L107 |
Step height measurement range 500 Å to 80 µm |
Prometrix Resistivity Mapping System prometrix |
Prometrix Training | All | SNF Cleanroom Paul G Allen L107 |
3 Probe Heads for different cleanliness groups. |
Flexus 2320 Stress Tester stresstest |
Stress Tester Flexus 2320 Training | All | SNF Cleanroom Paul G Allen L107 | |
Reflectance Spectrometer Filmetrics F40 filmetrics |
Reflectance Spectrometer Filmetrics F40 Training | All | SNF Cleanroom Paul G Allen L107 |
Equipment name & NEMO ID | Technique | Cleanliness | Material Thickness Range | Sample Size Limits | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|
Flexus 2320 Stress Tester stresstest |
All |
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1 | ||||
Nanospec 210XP nanospec2 |
All |
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Prometrix Resistivity Mapping System prometrix |
All |
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1 | ||||
Reflectance Spectrometer Filmetrics F40 filmetrics |
All | one piece or wafer | |||||
SEM -Zeiss Merlin sem-merlin |
All |
0.00 mm -
35.00 mm
|
6 in wafer |
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Tencor P2 Profilometer p2 |
Clean, Semiclean |
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1 | ||||
Woollam woollam |
All |
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1 |